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Rhenium outer
High-density, high-performance rhenium plate precision-rolled rhenium sheet, precision electron beam welding, perfect surface treatment to achieve high emissivity.Processing method: non-standard parts are processed according to customer drawings; standard accessories K465i, K700, A7 are provided; product repair services are provided.
Aluminum target
3N8-4N8 aluminum is mostly used for rolling aluminum foil of electrolytic capacitors, lighting fixtures and data storage. 5N-6N ultra-pure aluminum is mostly used in manufacturing semiconductor devices, manufacturing optoelectronic storage media, superconducting cable stabilization materials, and playing an important role in space shuttle scientific research. The picture below is the microscopic metallographic inspection picture of aluminum sputtering target, the average particle size is <300μm. We produce high-purity aluminum sputtering targets. Its biggest advantage is that in the process of physical vapor deposition, a thin film with excellent conductivity and particle minimization can be obtained. The following table is a certificate of composition analysis of 5N high-purity aluminum sputtering target.
Tantalum target,Ta sputtering target
Tantalum sheets and tantalum plates can be used to manufacture various inorganic acid preparation equipment, corrosion-resistant fasteners, supporting accessories, heat shields, heaters and heat sinks in high-temperature vacuum furnaces, water tanks, bridges and other steel Structure of the cathodic protection system.
