Changsha Rich Nonferrous Metals Co., Ltd

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Your location:Home>PRODUCTS>High-quality optoelectronic materials/high-purity targets
 Tungsten rhenium bracket  Tungsten rhenium bracket
Tungsten rhenium bracket
Used for MOCVD hot field heating plate support, diameter 1mm or customized, transferred to mold setting, can ensure high dimensional accuracy.
 Tungsten middle  Tungsten middle
Tungsten middle

The high-purity tungsten plate is used for slow wire cutting to ensure the stable high-temperature performance and finished size of the tungsten middle ring.
Thickness range: 1.2-2.4mm or customized according to customer requirements

 Rhenium outer  Rhenium outer
Rhenium outer
High-density, high-performance rhenium plate precision-rolled rhenium sheet, precision electron beam welding, perfect surface treatment to achieve high emissivity.
Processing method: non-standard parts are processed according to customer drawings; standard accessories K465i, K700, A7 are provided; product repair services are provided.
 Rhenium inner  Rhenium inner
Rhenium inner
Thickness range of rhenium sheet: 0.15-0.3mm or customized according to customer requirements
Processing method: non-standard parts are processed according to customer drawings; standard accessories K465i, K700, A7 are provided; product repair services are provided.
 Aluminum target  Aluminum target
Aluminum target
3N8-4N8 aluminum is mostly used for rolling aluminum foil of electrolytic capacitors, lighting fixtures and data storage. 5N-6N ultra-pure aluminum is mostly used in manufacturing semiconductor devices, manufacturing optoelectronic storage media, superconducting cable stabilization materials, and playing an important role in space shuttle scientific research. The picture below is the microscopic metallographic inspection picture of aluminum sputtering target, the average particle size is <300μm. We produce high-purity aluminum sputtering targets. Its biggest advantage is that in the process of physical vapor deposition, a thin film with excellent conductivity and particle minimization can be obtained. The following table is a certificate of composition analysis of 5N high-purity aluminum sputtering target.
 Molybdenum target  Molybdenum target
Molybdenum target
Purity specifications: 99.95%; 99.98%
Density: ≥10.10g/cm3
Organization: average grain size is less than 150 microns, typical target and surface structure
 Tantalum target,Ta sputtering target  Tantalum target,Ta sputtering target
Tantalum target,Ta sputtering target
Tantalum sheets and tantalum plates can be used to manufacture various inorganic acid preparation equipment, corrosion-resistant fasteners, supporting accessories, heat shields, heaters and heat sinks in high-temperature vacuum furnaces, water tanks, bridges and other steel Structure of the cathodic protection system.
 Ruthenium target, Ru sputtering target  Ruthenium target, Ru sputtering target
Ruthenium target, Ru sputtering target
Ruthenium target is mainly used in the field of vacuum coating
Purity: 99.95%
Uses: vacuum coating, experimental or research grade ruthenium targets, electronics, optoelectronics, military, decorative coating, functional films, etc.
 High purity tungsten target  High purity tungsten target
High purity tungsten target
1. Purity: 99.99%; 99.999%
2、Density:  ≥19.1g/cm3;
3、Flatness:≤2%; 
 Tungsten rhenium target  Tungsten rhenium target
Tungsten rhenium target
Our company uses solid-liquid mixing to improve the uniformity of rhenium, and at the same time, through multiple forging and annealing to increase the density and improve the structure, improve the performance and life of the anode target.
 Molybdenum Niobium Target  Molybdenum Niobium Target
Molybdenum Niobium Target
Purity: ≥99.95% Density: ≥8.6g/cm3 Melting point: 2468℃
Supply status: cold rolled bright surface Size range: 0.025min X 500max X L
Uses: vacuum coating, superconductivity, flat display, touch screen
 Tungsten Titanium Target  Tungsten Titanium Target
Tungsten Titanium Target
Depending on the purpose of use, there are different requirements for the impurity content of high-purity tungsten targets and tungsten-titanium targets. Generally, the chemical purity is required to be between 99.99% and 99.999%. We can also customize other specifications suitable for the application according to user requirements.
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Eutectic Alloy / Liquid Metal

  • Gallium-Indium-Tin(GaInSn)
  • Gallium-Indium
  • Mercury

Rare metals and their alloys

  • Gallium
  • Indium
  • Germanium
  • Tellurium
  • Bismuth
  • Beryllium
  • Selenium
  • Magnesium

Refractory metals and their alloys

  • Rhenium
  • Tungsten
  • Molybdenum
  • Tantalum
  • Niobium
  • Titanium
  • Zirconium
  • Hafnium
  • Vanadium

Precious Metal Compounds

  • Precious Metal Compounds
  • Rhenium Compounds

Precious metal functional materials

  • Ruthenium
  • Osmium
  • Iridium
  • Platinum
  • Rhodium
  • Palladium
  • Gold
  • Silver

High-quality optoelectronic materials/high-purity targets

  • MOCVD heating parts
  • Sputtering target
  • High purity metal
  • Evaporation materials
  • Heat sink material

Powder metallurgy intermediate products & Special powder

  • Spherical powder
  • Nano powder
  • Powder metallurgy intermediate products

Rare earth and functional materials

  • Rare earth metals
  • Rare earth alloys
  • Rare earth compounds

Changsha Rich Nonferrous Metals Co., Ltd

Services

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  • RICHI-METALS DIVISIONS
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PRODUCTS

  • Eutectic Alloy / Liquid Metal
  • Rare metals and their alloys
  • Refractory metals and their alloys
  • more...

Contact Info

Address: No394.Gr8,Zhang Gong Ling Vil, Ma Po Ling Sub-Dis, Furong Dist, Changsha, Hunan, China

Phone/Fax: 0086-731-84613739

Email: info@rich-metals.com

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